Electron beam evaporation is a method of thin film deposition involving the use of an electron beam source, or electron beam gun (EB gun).
Both names are commonly used, but the actual device consists of a heated cathode emitting a high flux of electrons which are accelerated by high voltage and focussed into a water cooled hearth by a magnetic system.
The material to be evaporated (the evaporant) is placed in a crucible within the hearth where it is heated to vaporization which then deposits on the substrate to form the required thin film.
The electron beam evaporation technique enables very high temperatures to be obtained, allowing fast deposition rates and a wide range of materials to be evaporated.
The technique is controllable, repeatable and compatible with the use of an ion source to enhance the resultant thin film performance characteristics.