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Sputtering for Thin Film Deposits

Sputtering process is used in a variety of applications such as flat panel displays, optical discs, automotive and architectural glass, web coating, hard coatings, optical communications, solar cells, semiconductors, magnetic data storage devices, electron microscopy, and decorative applications. Typical materials used in these applications are Copper, Chromium, Chromium-Molybdenum, Aluminium, Titanium, Aluminium-Titanium, Tungsten, Nickel, Silicon, Indium […]

Composition Measure of Thin Films by Sputtering

Secondary Ion Mass Spectrometry (SIMS) is a technique used in materials science to study the composition of thin films and solid surfaces by sputtering the sample’s surface with a focused primary ion beam. In recent years, there has been an increasing interest in studying dopants and contaminants in thin layers near surface in samples, as […]

Gold Coating is a Thin Film of Gold Deposited Onto a Substrate

A gold coating is a very thin film of gold deposited onto a supporting substrate. This serves as a very useful substrate in the life science academia & industrial markets. Typical characteristics of gold surfaces include: Good resistance to oxidation Inert surface for use with biological experimentation Good conductor of electricity Ultra smooth surfaces can […]

Analyzing Thin Metal Films

Sputtered Neutral Mass Spectrometry is perfect for analyzing thin metal films where composition, thickness and interface condition can be determined. The example presented here, shows a magnetic film stack comprising Cr, Ni, Cu and Fe. Of the different methods of data storage, magnetic hard discs still offer highly economic means for high density rapid access. […]

New Sputtering Target Innovations

Magnetron sputtering was initially developed using metal or alloy targets with materials having high electrical conductivity (e.g., Al, Ag, Au, Cu, Ti, Mo, etc.). In order to achieve acceptable deposition rates, the target material needed to be electrically and thermally conductive. Ceramic targets were developed for transparent conductive oxides (TCOs) and usually consisted of films […]

Successful Large-Area Sputtering

Cylindrical rotating magnetrons can provide controlled reactive sputtering on both large areas and high-volume products, while also minimizing arcing and anode problems. Magnetron sputtering, combined with an accurate control of process parameters and layer quality, has become one of the most important methods for depositing thin films. The technique involves bombarding a target surface, which […]

Vacuum Coating by Sputtering

Vacuum coating by sputtering has established a leading position for the deposition of thin films because of its relatively easy scalability to high volumes and sizes, its good control of most layer characteristics, and its wide variety of available materials and possible coating stacks. The technology is commonly accepted and widely used in the architectural […]

What are Sputtering Targets?

A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the sputtering target material, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is […]

Functional Thin Films and Sputtering Target Materials

Sputtering targets provide thin-film materials deposited by the sputtering method. Kobelco Research Institute, Inc. started the target material business in 1993 and its competitive strength exists in the approach of originally developing high- performance film-materials before providing the target-materials required to make the films. The research and development group of Kobe Steel is responsible for […]

Metal Targets during Sputtering

When a Cu surface is sputtered by ion bombardment under the condition that Mo atoms arrive at the Cu surface during sputtering an unexpected phenomenon can arise: the surface of the Cu target becomes covered with microscopic cones. The cone density increases with increasing flux density of arriving Mo atoms. When the cones are closely […]