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Functional Thin Films and Sputtering Target Materials

Sputtering targets provide thin-film materials deposited by the sputtering method. Kobelco Research Institute, Inc. started the target material business in 1993 and its competitive strength exists in the approach of originally developing high- performance film-materials before providing the target-materials required to make the films. The research and development group of Kobe Steel is responsible for […]

Metal Targets during Sputtering

When a Cu surface is sputtered by ion bombardment under the condition that Mo atoms arrive at the Cu surface during sputtering an unexpected phenomenon can arise: the surface of the Cu target becomes covered with microscopic cones. The cone density increases with increasing flux density of arriving Mo atoms. When the cones are closely […]

Alloy Sputtering Target

A sputtering target of platinum-cobalt alloy is disclosed which contains 10 to 55% by weight of platinum; 1 to 15% by weight of a first additional element selected from the group consisting of nickel and tantalum; no more than 1.5% by weight of a second additional element selected from the group consisting of boron, titanium, […]

Composite Sputtering Target Structures

A target structure is provided for use in a magnetically enhanced diode sputter coating source having a sputtering target which at end-of-life has an eroded surface with a known shape. The sputtering target has a non-sputtered profiled back surface conforming substantially in shape to the eroded surface at end-of-life. A backing plate is bonded to […]

Superhard Thin Film Coatings

As a result of increased requirements for abrasion resistant and protective thin film coatings, the hardness of thin film coatings has been steadily increasing over the past decade, due primarily to new materials, improved deposition processes and use of nanostructures and nanocomposites. Because it would not be possible to address all these materials, we will […]

Electron Beam Gun Crucibles & Thin Film Deposition

Electron beam evaporation is a method of thin film deposition involving the use of an electron beam source, or electron beam gun (EB gun). Both names are commonly used, but the actual device consists of a heated cathode emitting a high flux of electrons which are accelerated by high voltage and focussed into a water […]

Thin Film Deposition

Thin film deposition processes play a critical role in the production of high-density, high-performance microelectronic products. Considerable progress has been achieved in the development of deposition processes — and in the development of the reactor systems in which they are carried out. This report discusses the technology trends, products, applications, and suppliers of materials and […]

Thin Film Deposition Materials

Thin film material are widely used in various industries for one or more applications. They are used in the encapsulation of photovoltaic solar cell, semiconductor and electrical industry for miniaturization of circuit boards. Their major application is in photovoltaic solar cells, which accounts for a majority of their usage, followed by the MEMS, electrical, semiconductor, […]

Thin Film Coating – Atomic Layer Deposition Method

High quality thin films with excellent chemical and structural purity, uniformity, and conformality can be manufactured using the ALD method, which involves gas-solid chemical adsorption reactions over the surface. These reactions are self-controlled and self-limiting, resulting in film growth by consecutive atomic layers. A wide choice of materials can be deposited, including oxides, nitrides, fluorides, […]

High Purity Thin Films – Ion Beam Sputter Deposition

Ion beam sputter deposition is a process that is employed in a wide range of applications where high quality, high performance layer materials and precision film control are of great importance. However, this process has certain difficulties – for instance, when an ion beam is used to sputter a target material, it is difficult to […]