Electron beam evaporation is a method of thin film deposition involving the use of an electron beam source, or electron beam gun (EB gun). Both names are...
As a result of increased requirements for abrasion resistant and protective thin film coatings, the hardness of thin film coatings has been steadily increasing...
A target structure is provided for use in a magnetically enhanced diode sputter coating source having a sputtering target which at end-of-life has an eroded...
A sputtering target of platinum-cobalt alloy is disclosed which contains 10 to 55% by weight of platinum; 1 to 15% by weight of a first additional element...
When a Cu surface is sputtered by ion bombardment under the condition that Mo atoms arrive at the Cu surface during sputtering an unexpected phenomenon can...
Sputtering targets provide thin-film materials deposited by the sputtering method. Kobelco Research Institute, Inc. started the target material business in...
A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process...
Vacuum coating by sputtering has established a leading position for the deposition of thin films because of its relatively easy scalability to high volumes and...
Cylindrical rotating magnetrons can provide controlled reactive sputtering on both large areas and high-volume products, while also minimizing arcing and anode...
Magnetron sputtering was initially developed using metal or alloy targets with materials having high electrical conductivity (e.g., Al, Ag, Au, Cu, Ti, Mo, etc...