At KAMIS, We Do More

Kamis is committed to providing high quality products and dependable service. We supply raw product such as metal sheet with the exact width, length, thickness, flatness and surface finish you specify.

We also supply finished machine parts with exact dimensional tolerances. But at Kamis we do more than supply products, we supply high quality service because we understand your business. Whether your application calls for RARE EARTH or a REFRACTORY metal, Kamis can assist you.

Please call or e-mail Kamis with your technical questions on any metal.

Kamis Inc.

Need Help Finding the Right Crucible?Contact us today at 845-628-6173 or email with your questions or to discuss your specific project.

Thin-Film Technology Of The Ancient World

KAMIS offers high quality sputtering targets, evaporation materials, crucible liners and other metals to help you meet the needs of your organization. For over two decades, KAMIS has been a trusted partner to the semiconductor industry, top research faculties and universities around the world.

Artists and craftsmen more than 2,000 years ago developed thin-film coating technology unrivaled even by today’s standards for producing DVDs, solar cells, electronic devices and other products. Understanding these sophisticated metal-plating techniques from ancient times, described in the ACS journal Accounts of Chemical Research, could help preserve priceless artistic and other treasures from the past.

Gabriel Maria Ingo and colleagues point out that scientists have made good progress in understanding the chemistry of many ancient artistic and other artifacts — crucial to preserve them for future generations. Big gaps in knowledge remained, however, about how gilders in the Dark Ages and other periods applied such lustrous, impressively uniform films of gold or silver to intricate objects. Ingo’s team set out to apply the newest analytical techniques to uncover the ancients’ artistic secrets.

They discovered that gold- and silversmiths 2,000 years ago developed a variety of techniques, including using mercury like a glue to apply thin films of metals to statues and other objects. Sometimes, the technology was used to apply real gold and silver. It also was used fraudulently, to make cheap metal statues that look like solid gold or silver. The scientists say that their findings confirm “the high level of competence reached by the artists and craftsmen of these ancient periods who produced objects of an artistic quality that could not be bettered in ancient times and has not yet been reached in modern ones.” Read More

Sputtering Target Bonding

Metallic bonding delivers excellent thermal conductivity and is recommended for most sputtering target applications.

The most effective metallic bonding is with indium and is the preferred Kamis sputtering target bonding method. Kamis uses only high purity indium for the majority of its bonding, to ensure the strongest bond between a sputtering target and a backing plate. Indium also offers enhanced elasticity to accommodate any expansion of the target when in use.

Another advantage of bonding sputtering targets is continued use if cracking occurs during thermal shock. Without bonding to a backing plate, a crack in a sputtering target is considered unusable.

Hot pressed targets are one of the best candidates for bonding; however Kamis can bond almost any type of sputtering target to a backing plate. If you are unsure if your sputtering target should be bonded, feel free to contact us for specific advice about your target and sputtering system requirements.

Most sputtering targets are bonded to copper backing plates or copper sheet, as this material offers enhanced thermal conductivity. Kamis also offers other sputtering target backing plate options including stainless steel, molybdenum and aluminum.

Additionally, Kamis stocks numerous sputtering targets and backing plates in a wide variety of sizes and purities to work with multiple sputtering systems. Kamis also offers custom alloys and composites manufactured to your sputtering target specifications.

Kamis can bond a sputtering target to a new backing plate or to your previously used backing plate. Additionally, we have experience in bonding to a variety of backing plates including ones with holes, clips and other variations.

In addition to bonding, Kamis also offers a de-bonding service to remove your spent sputtering target from your backing plate. High purity sputtering targets can be reclaimed when the target is no longer usable for sputtering.

The Kamis sales engineers are available to answer your unique sputtering target questions at 845-628-6173 or

Sputtering Targets: Depositing Thin Films

Sputtering is a unique and repeatable process and has the ability to deposit thin films from a range of materials on to different shapes and sizes of substrates. The process can be upgraded from research and development projects to manufacturing of batches involving medium to large substrate areas.

In order to realize efficient momentum, transfer projectile mass must be able to match target mass. Therefore, for sputtering heavy elements xenon or krypton is used and for light elements neon is utilized. Generally, sputtering gas is an inert gas, such as argon.

Normally, reactive gases are utilized for sputtering compounds. The chemical reaction can take place on the substrate or on the target surface depending on the parameters of the process. These parameters make sputter deposition a challenging process, but nevertheless provide experts a greater level of control over the microstructure and growth of the film.

In order to obtain the required characteristics in a sputter deposited thin film, the production process utilized to build the sputtering target can be of significant importance. Regardless of the fact that the target material has an element, mixture of elements, compound, or alloys, the process undertaken to create that defined material, which is ideal for sputtering thin films of uniform quality, is equally important as the deposition run parameters perfected by scientists and engineers dealing in thin film processes.

Sputtering Targets and Sputtered Films

Sputtering is one of the most popular technologies for deposition of thin films. Although sputtering was first developed about 200 years ago, since World War II it has become increasingly important for the creation of innovative devices, becoming fundamental in sustaining the growing demand for semiconductor circuits and other electronic devices.

Sputtering targets have found increasing penetration not only in electronics, but also in sectors such as mechanical/chemical, energy, optical coating, and life science, among others.

Although for decades sputtering was primarily used in microelectronics for fabrication of semiconductor devices, in recent years, as the semiconductor industry transitions to new processes that allow for the fabrication of thin films below 20 nm, sputtering has found alternative sources of demand in other industry segments such as flat panel displays and solar cell manufacturing.

In fact, over time the availability of sputtering materials has expanded to meet the requirements of the most varied applications within the electronics, mechanical/chemical, energy, optical coatings, life science, and food packaging sectors. Read More

Novel Technologies to be Developed for Thin-Film Deposition

A three-year project awarded by the Defense Advanced Research Projects Agency to develop novel technologies for depositing thin films is underway.

The contract award is under DARPA’s Local Control of Materials Synthesis (LoCo) program, which is investigating non-thermal approaches for depositing thin-film coatings onto the surfaces of a variety of materials. The objective of the program is to overcome the reliance on high-thermal energy input by examining the process of thin-film deposition at the molecular component level in areas such as reactant flux, surface mobility and reaction energy, among others.

Many current high-temperature deposition processes cannot be used on military vehicles and other equipment because they exceed the temperature limit of the material. The LoCo program will attempt to create new, low-temperature deposition processes and a new range of coating-substrate pairings to improve the surface properties of materials used in a wide range of defense technologies including rotor blades, infrared missile domes and photovoltaics, among others. Read More

KAMIS manufactures sputtering targets for all sputtering systems in pure metals, alloys, and ceramic materials. 

The Vacuum Process of Thin Film Deposition

The vacuum process of thin film deposition involves the application of coatings of pure materials over the surface of varied and differing objects. The thickness of coatings or films typically possess a range of microns and angstroms and can be of single material or a layered structure of multiple materials. Using quartz crystal monitoring, there are basic principles used to control the thickness and rate of thin film deposition.

The key class of deposition methods is evaporation which involes heating a solid material within a high vacuum chamber in which vapor pressure is produced. A relatively low vapor pressure is adequate to raise a vapor cloud within the vacuum chamber, which is then condensed over surfaces as a coating or film.

Call Kamis for all your Thin Film Coating questions.


Thin Film Materials

The thin film material market value will grow to $10.25 billion by 2018, at a significant CAGR from 2013 to 2018.

The thin film material market is directly influenced by the growth in the end-user industries, such as photovoltaic solar cells, MEMS, electrical, and others. Owing to the increasing demand for photovoltaic solar cells from both mature and emerging economies, the market promises better growth in the coming years.

Increased government regulations for renewable energy also contribute to the market growth of the photovoltaic solar cells industry.

Europe represents the single-largest market for thin film material for the same period, followed by North America, and Asia-Pacific.

In terms of applications, photovoltaic solar cells, MEMS, semiconductor, electrical and optical coating are major applications of thin film material. Read More

Thin Film Vacuum Coating on Flat Substrates

Vision Flat is an international technology and networking event that celebrates twenty years of research and development in the field of thin-film vacuum coating on flat substrates at the Fraunhofer FEP.

Representatives of leading companies, Corning Inc., Saint-Gobain Glass, Schott AG and experts in this field will highlight recent technological achievements and provide an outlook on future trends. New smart products and the global increasing demand for transparent architecture are posing new challenges to the fabrication and handling of flat materials such as glass, flexible glass and polymers.

The technology session will cover the aspects of large-area, homogeneous, dynamic layer deposition, up-scaling of coating processes, in-line process monitoring, deposition of layer systems via sputtering for architectural glazing, lighting, automotive applications and optics. Read More