High Purity Thin Films – Ion Beam Sputter Deposition

Ion beam sputter deposition is a process that is employed in a wide range of applications where high quality, high performance layer materials and precision film control are of great importance.

However, this process has certain difficulties – for instance, when an ion beam is used to sputter a target material, it is difficult to control the beam shape and collimation so as to prevent any energetic ions following trajectories whereby they could sputter other materials other than the intended target material, such as surrounding fixtures and furniture.

This may possibly contaminate the depositing film with impurities. The impact of this on the performance of the deposited film will depend on the levels of impurities, on the specific application targeted, and on the nature of the impurities.

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