Sputtering Targets and Depositing Thin Films from Kamis, Inc. Sputtering is a unique and repeatable process and has the ability for depositing thin films from a range of materials on to different shapes and sizes of substrates. The process can be upgraded from research and development projects to manufacturing of batches involving medium to large […]
Kamis Sputtered Films for the Deposition of Thin and Sputtered Films Sputtering is one of the most popular technologies for deposition of thin films or Sputtered Films. Although sputtering was first developed about 200 years ago, since World War II it has become increasingly important. This includes the creation of innovative devices. Also becoming fundamental […]
It’s Kamis for Thin Metal Films Sputtered Neutral Mass Spectrometry is perfect for analyzing thin metal films where composition, thickness and interface condition can be determined. The example presented here, shows a magnetic film stack comprising Cr, Ni, Cu and Fe. Of the different methods of data storage, magnetic hard discs still offer highly economic […]
KAMIS Consistently Provides High Quality Metal Targets KAMIS provides a range of forms, sizes and configurations of pure PVD sputtering metal targets for thin film coating applications. Consequently, our metal sputtering targets are guaranteed for reproducibility, homogeneity and uniformity. When a Cu surface is sputtered by ion bombardment under the condition that Mo atoms arrive […]
Thin Film Sputtering Composition Technique in the Sputtering Process Secondary Ion Mass Spectrometry (SIMS) is a Thin Film Sputtering technique. Used in materials, this science studies the composition of thin films and solid surfaces. Implemented by using the sputtering the sample’s surface with a focused primary ion beam. In recent years, there has been an […]
Sputtering Target Bonding Methods Metallic bonding delivers excellent thermal conductivity and is recommended for most sputtering target bonding applications. The most effective metallic bonding is with indium and is the preferred Kamis sputtering target bonding method. Kamis uses only high purity indium for the majority of its bonding, to ensure the strongest bond between a […]
Thin film materials have thousands uses for highly specialized technologies and everyday items. The thin film material market continues to grow and so does demand. Kamis is the premier source for thin film materials to clients all over the world. The thin film material market is directly influenced by the growth in the end-user industries, […]
Kamis for Thin Film Applications for Optical Coatings for a Lens, Mirrors, and Semiconductor Devices Kamis Inc. is a supplier for thin film applications and a trusted partner to the vacuum coating industry for top research facilities and universities around the world. Look to Kamis for highest standard products and tools used to produce nano […]
Sputtering Target: It’s Always Kamis! The Sputtering Target process is where particles are ejected from a solid target material due to bombardment of the target by energetic particles, particularly gas ions in a laboratory and is capable of depositing thin films from varied materials onto a diverse substrate sizes and shapes. Kamis provides materials such […]
Premier High Purity Evaporation Material Provider Kamis provides High Purity Evaporation Material for the premier research facilities and universities worldwide. We partner with clients with their needs in mind in order to complete projects on time and within budget. The successful performance of our products is dependent on the customized use of high purity materials […]