Thin film deposition processes play a critical role in the production of high-density, high-performance microelectronic products.
Considerable progress has been achieved in the development of deposition processes — and in the development of the reactor systems in which they are carried out.
This report discusses the technology trends, products, applications, and suppliers of materials and equipment.
It also gives insights to suppliers for future user needs and should assist them in long range planning, new product development and product improvement.
This report compares some of the issues impacting users of different deposition tools, including: APCVD (SACVD), LPCVD, PECVD, HDPCVD, ALCVD, PVD, ALD. Read More