High quality thin films with excellent chemical and structural purity, uniformity, and conformality can be manufactured using the ALD method, which involves gas-solid chemical adsorption reactions over the surface. These reactions are self-controlled and self-limiting, resulting in film growth by consecutive atomic layers. A wide choice of materials can be deposited, including oxides, nitrides, fluorides, […]
Ion beam sputter deposition is a process that is employed in a wide range of applications where high quality, high performance layer materials and precision film control are of great importance. However, this process has certain difficulties – for instance, when an ion beam is used to sputter a target material, it is difficult to […]
There are two principal approaches to achieve this effect, namely Subtractive, or the Etch Back process; and Additive, or the Lift Off process. Subtractive, or the Etch Back process involves the coating of the entire surface, followed by the removal of select portions to form the desired pattern. Some sort of physical masking agent is […]
Thin Film Deposition is a vacuum process that involves the application of coatings of pure materials over the surface of many different objects. The coatings or films typically have a thickness range of microns and angstroms and can be of single material or multiple materials in a layered structure. This article covers the basic principles […]