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Sputtering Target and Thin Film Deposition

Sputtering Target: It’s Always Kamis! The Sputtering Target process is where particles are ejected from a solid target material due to bombardment of the target by energetic particles, particularly gas ions in a laboratory and is capable of depositing thin films from varied materials onto a diverse substrate sizes and shapes. Kamis provides materials such […]

High Purity Evaporation Material for Research Facilities and Universities

Premier High Purity Evaporation Material Provider Kamis provides High Purity Evaporation Material for the premier research facilities and universities worldwide. We partner with clients with their needs in mind in order to complete projects on time and within budget. The successful performance of our products is dependent on the customized use of high purity materials […]

At KAMIS, We Do More

Kamis is committed to providing high quality products and dependable service. We supply raw product such as metal sheet with the exact width, length, thickness, flatness and surface finish you specify. We also supply finished machine parts with exact dimensional tolerances. But at Kamis we do more than supply products, we supply high quality service […]

Thin-Film Technology Of The Ancient World

KAMIS offers high quality sputtering targets, evaporation materials, crucible liners and other metals to help you meet the needs of your organization. For over two decades, KAMIS has been a trusted partner to the semiconductor industry, top research faculties and universities around the world. Artists and craftsmen more than 2,000 years ago developed thin-film coating […]

Novel Technologies to be Developed for Thin-Film Deposition

A three-year project awarded by the Defense Advanced Research Projects Agency to develop novel technologies for depositing thin films is underway. The contract award is under DARPA’s Local Control of Materials Synthesis (LoCo) program, which is investigating non-thermal approaches for depositing thin-film coatings onto the surfaces of a variety of materials. The objective of the […]

Sputtering for Thin Film Deposits

Sputtering process is used in a variety of applications such as flat panel displays, optical discs, automotive and architectural glass, web coating, hard coatings, optical communications, solar cells, semiconductors, magnetic data storage devices, electron microscopy, and decorative applications. Typical materials used in these applications are Copper, Chromium, Chromium-Molybdenum, Aluminium, Titanium, Aluminium-Titanium, Tungsten, Nickel, Silicon, Indium […]

Gold Coating is a Thin Film of Gold Deposited Onto a Substrate

A gold coating is a very thin film of gold deposited onto a supporting substrate. This serves as a very useful substrate in the life science academia & industrial markets. Typical characteristics of gold surfaces include: Good resistance to oxidation Inert surface for use with biological experimentation Good conductor of electricity Ultra smooth surfaces can […]

New Sputtering Target Innovations

Magnetron sputtering was initially developed using metal or alloy targets with materials having high electrical conductivity (e.g., Al, Ag, Au, Cu, Ti, Mo, etc.). In order to achieve acceptable deposition rates, the target material needed to be electrically and thermally conductive. Ceramic targets were developed for transparent conductive oxides (TCOs) and usually consisted of films […]

Successful Large-Area Sputtering

Cylindrical rotating magnetrons can provide controlled reactive sputtering on both large areas and high-volume products, while also minimizing arcing and anode problems. Magnetron sputtering, combined with an accurate control of process parameters and layer quality, has become one of the most important methods for depositing thin films. The technique involves bombarding a target surface, which […]