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Thin-Film Technology Of The Ancient World

KAMIS offers high quality sputtering targets, evaporation materials, crucible liners and other metals to help you meet the needs of your organization. For over two decades, KAMIS has been a trusted partner to the semiconductor industry, top research faculties and universities around the world. Artists and craftsmen more than 2,000 years ago developed thin-film coating […]

Sputtering Targets: Depositing Thin Films

Sputtering is a unique and repeatable process and has the ability to deposit thin films from a range of materials on to different shapes and sizes of substrates. The process can be upgraded from research and development projects to manufacturing of batches involving medium to large substrate areas. In order to realize efficient momentum, transfer […]

Novel Technologies to be Developed for Thin-Film Deposition

A three-year project awarded by the Defense Advanced Research Projects Agency to develop novel technologies for depositing thin films is underway. The contract award is under DARPA’s Local Control of Materials Synthesis (LoCo) program, which is investigating non-thermal approaches for depositing thin-film coatings onto the surfaces of a variety of materials. The objective of the […]

The Vacuum Process of Thin Film Deposition

The vacuum process of thin film deposition involves the application of coatings of pure materials over the surface of varied and differing objects. The thickness of coatings or films typically possess a range of microns and angstroms and can be of single material or a layered structure of multiple materials. Using quartz crystal monitoring, there […]

Thin Film Vacuum Coating on Flat Substrates

Vision Flat is an international technology and networking event that celebrates twenty years of research and development in the field of thin-film vacuum coating on flat substrates at the Fraunhofer FEP. Representatives of leading companies, Corning Inc., Saint-Gobain Glass, Schott AG and experts in this field will highlight recent technological achievements and provide an outlook […]

Sputtering for Thin Film Deposits

Sputtering process is used in a variety of applications such as flat panel displays, optical discs, automotive and architectural glass, web coating, hard coatings, optical communications, solar cells, semiconductors, magnetic data storage devices, electron microscopy, and decorative applications. Typical materials used in these applications are Copper, Chromium, Chromium-Molybdenum, Aluminium, Titanium, Aluminium-Titanium, Tungsten, Nickel, Silicon, Indium […]

Gold Coating is a Thin Film of Gold Deposited Onto a Substrate

A gold coating is a very thin film of gold deposited onto a supporting substrate. This serves as a very useful substrate in the life science academia & industrial markets. Typical characteristics of gold surfaces include: Good resistance to oxidation Inert surface for use with biological experimentation Good conductor of electricity Ultra smooth surfaces can […]

New Sputtering Target Innovations

Magnetron sputtering was initially developed using metal or alloy targets with materials having high electrical conductivity (e.g., Al, Ag, Au, Cu, Ti, Mo, etc.). In order to achieve acceptable deposition rates, the target material needed to be electrically and thermally conductive. Ceramic targets were developed for transparent conductive oxides (TCOs) and usually consisted of films […]

Successful Large-Area Sputtering

Cylindrical rotating magnetrons can provide controlled reactive sputtering on both large areas and high-volume products, while also minimizing arcing and anode problems. Magnetron sputtering, combined with an accurate control of process parameters and layer quality, has become one of the most important methods for depositing thin films. The technique involves bombarding a target surface, which […]