Metal Targets During Sputtering
KAMIS Consistently Provides High Quality Metal Targets
KAMIS provides a range of forms, sizes and configurations of pure PVD sputtering metal targets for thin film coating applications. Consequently, our metal sputtering targets are guaranteed for reproducibility, homogeneity and uniformity.
When a Cu surface is sputtered by ion bombardment under the condition that Mo atoms arrive at the Cu surface during sputtering an unexpected phenomenon can arise: the surface of the Cu target becomes covered with microscopic cones. Also contact KAMIS about Au, Pt, Gd, Be, Ca, Sm, Ag, W, Zn, Ti, Nb, Pd, Sc, Cr, Rh, Mn, metal sputtering targets.
Dense Cone Coverage and Sputtering Yield
The cone density increases with increasing flux density of arriving Mo atoms. When the cones are closely spaced they give the target a velvet-like black appearance. The result of dense cone coverage are a lower sputtering yield and a more oblique ejection of sputtered material.
Finally, the cone tops seem to consist of Mo nuclei which are constantly replenished via surface migration and protect the underlying Cu from being sputtered.
Got specific requirements or Questions about sputtering targets, evaporation material, crucible liners, metal foil, sheet, plate, or rod and wire? The technical staff at KAMIS is ready to provide expert knowledge to assist you with your project.
Contact KAMIS today at 845-628-6173 or click the blue button below for quick answers and attention from our knowledgeable staff.
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