Kamis Sputtered Films for the Deposition of Thin and Sputtered Films
Sputtering is one of the most popular technologies for deposition of thin films or Sputtered Films. Although sputtering was first developed about 200 years ago, since World War II it has become increasingly important. This includes the creation of innovative devices. Also becoming fundamental in sustaining the growing demand for semiconductor circuits and other electronic devices.
Sputtering targets have found increasing penetration not in electronics. Additionally, it is in use in sectors such as mechanical/chemical, energy, optical coating, and life science, among others.
Fabrication processes for thin films
For decades sputtering was primarily used in microelectronics for fabrication of semiconductor devices. Though in recent years, the semiconductor industry transitions to new processes that allow for the fabrication of thin films below 20 nm. Sputtering has found alternative sources of demand in other industry segments. It is used variously in such products as flat panel displays and solar cell manufacturing.
In fact, over time the availability of sputtering materials has expanded. This meets the requirements of the most varied applications within the electronics, mechanical/chemical, energy, optical coatings, life science, and food packaging sectors.
Got specific requirements or Questions about sputtering targets, evaporation material, crucible liners, metal foil, sheet, plate, or rod and wire? The technical staff at KAMIS is ready to provide expert knowledge to assist you with your project.
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