Thin Film Deposition Vacuum Process

The vacuum process of thin film deposition involves the application of coatings of pure materials over the surface of different objects. The thickness of coatings or films typically possess a range of microns and angstroms. Therefore, they can be of single material or a layered structure of multiple materials.

Using quartz crystal monitoring, there are basic principles used to control the thickness and rate of thin film deposition. Secondly, this process is effectively used for many component products like cell phones, screen displays and even eyeglasses. Over the surface pure materials are applied as coatings on varied objects.

The key class of deposition methods is evaporation which involves heating a solid material within a high vacuum chamber in which vapor pressure is produced. Consequently, relatively low vapor pressure is adequate to raise a vapor cloud within the vacuum chamber, which is then condensed over surfaces as a coating or film.

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