Vacuum Coating by Sputtering
Vacuum coating by sputtering has established a leading position for the deposition of thin films. This is because of its relatively easy scalability to high volumes and sizes, its good control of most layer characteristics, and its wide variety of available materials and possible coating stacks. Moreover, the technology is commonly accepted and widely used in the architectural and automotive industries. However, in display and PV applications, the use of rotatable technology has been introduced more recently.
Within the large area coating business, the rotating cylindrical magnetron concept has proven to offer superior properties relative to the planar concept and to satisfy most industrial requirements. The geometry and sputter performance of rotating cylindrical sputter targets result in several advantages relative to planar sputter targets.
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Kamis is adept at complex composite synthesis and alloy preparation for hot pressed ceramics and vacuum cast targets. We employ a range of melting, crushing, screening, and blending techniques to formulate non-standard and one off R&D compounds. Complete material characterization is performed and provided on all thin film materials. Contact Kamis with any queries concerning Vacuum coating by sputtering.
Coatings are available in a large range for many different applications. The properties of these coatings can and have been improved. This is done by the addition of other elements such as vanadium, yttrium, chromium etc. Also by the development of multilayers by material design. If you have a particular question or request, please do not hesitate to contact Kamis. We always endeavor to accommodate your specific needs.
Our highly trained and certified staff can handle the manufacture of both standard OEM sputter system backing plates and customer-designed units. Customers will receive properly finished sealing surfaces and tight-toleranced dimensions.
Kamis serves the growing demands of the vacuum thin film coating industry. Our commitment to quality products, timely customer service and industry leading deliveries has been the cornerstone of our success. In conclusion, Kamis offers the thin film industry virtually any ceramic, precious, or non-precious PVD material.
Find quality sputtering metals for the thin film deposition manufacturing process at Kamis. Sputtering process is used in a variety of applications such as flat panel displays, optical discs, automotive and architectural glass, web coating, hard coatings, optical communications, solar cells, semiconductors, magnetic data storage devices, electron microscopy, and decorative applications.
Sputtering is a unique and repeatable process and has the ability for depositing thin films from a range of materials on to different shapes and sizes of substrates. The process can be upgraded from research and development projects to manufacturing of batches involving medium to large substrate areas.
Sputtering is one of the most popular technologies for deposition of thin films or Sputtered Films. Although sputtering was first developed about 200 years ago, since World War II it has become increasingly important. This includes the creation of innovative devices. Also becoming fundamental in sustaining the growing demand for semiconductor circuits and other electronic devices.
Metallic bonding delivers excellent thermal conductivity and is recommended for most sputtering target bonding applications.
The Sputtering Target process is where particles are ejected from a solid target material due to bombardment of the target by energetic particles, particularly gas ions in a laboratory and is capable of depositing thin films from varied materials onto a diverse substrate sizes and shapes. Kamis provides materials such as Aluminum, Lithium, Barium, Copper, Gold, Silver and many more which can be utilized in your sputtering target and thin film deposition applications. To identify the best material for your projects, please call or email Kamis, or click the Blue Button below!