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Sputtering Metals for Thin Film Deposits

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Sputtering MetalsFind quality sputtering metals for the thin film deposition manufacturing process at Kamis. Sputtering process is used in a variety of applications such as flat panel displays, optical discs, automotive and architectural glass, web coating, hard coatings, optical communications, solar cells, semiconductors, magnetic data storage devices, electron microscopy, and decorative applications.

Typical materials used in these applications and available at Kamis are Copper, Chromium, Chromium-Molybdenum, Aluminium, Titanium, Aluminium-Titanium, Tungsten, Nickel, Silicon, Indium and Silver, amongst others. You have exact and precise purity requirements for your thin film deposition needs. The technical staff at Kamis is ready with expert knowledge to personally help you with your projects.

Sputtering process can be used for depositing thin films from a wide range of materials on to different substrates. Although process parameters make sputtering a complex process, they allow a greater degree of control over the film’s growth and structure. Consequently, Kamis knows the quality of thin film coating is a critical component and depends on obtaining unmatched purity of materials.

Call Kamis for Sputtering Metals and all your Thin Film Vacuum Coating questions.

Contact Kamis

Got specific requirements or Questions about sputtering targets, evaporation material, crucible liners, metal foil, sheet, plate, or rod and wire? The technical staff at KAMIS is ready to provide expert knowledge to assist you with your project.

Therefore, contact KAMIS today at 845-628-6173. Click the blue button below for quick answers and attention from our knowledgeable staff.

KAMIS prides itself on consistently providing high quality materials and dependable service. We stand behind every product we deliver. If you are ever unsatisfied with your material, contact KAMIS for a full replacement or refund.

Kamis Inc

The entire support staff and sales engineers at KAMIS are always available during business hours. Call us to answer your technical questions and offer guidance on your projects.

Finally, our expertise and commitment to supplying high quality products and service has enabled KAMIS to earn thousands of satisfied customers around the world.

Thin Film Vacuum Coating

Metal Targets During Sputtering

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KAMIS Consistently Provides High Quality Metal Targets

Metal TargetsKAMIS provides a range of forms, sizes and configurations of pure PVD sputtering metal targets for thin film coating applications. Consequently, our metal sputtering targets are guaranteed for reproducibility, homogeneity and uniformity.

When a Cu surface is sputtered by ion bombardment under the condition that Mo atoms arrive at the Cu surface during sputtering an unexpected phenomenon can arise: the surface of the Cu target becomes covered with microscopic cones. Also contact KAMIS about Au, Pt, Gd, Be, Ca, Sm, Ag, W, Zn, Ti, Nb, Pd, Sc, Cr, Rh, Mn, metal sputtering targets.

Dense Cone Coverage and Sputtering Yield

The cone density increases with increasing flux density of arriving Mo atoms. When the cones are closely spaced they give the target a velvet-like black appearance. The result of dense cone coverage are a lower sputtering yield and a more oblique ejection of sputtered material.

Finally, the cone tops seem to consist of Mo nuclei which are constantly replenished via surface migration and protect the underlying Cu from being sputtered.

Got specific requirements or Questions about sputtering targets, evaporation material, crucible liners, metal foil, sheet, plate, or rod and wire? The technical staff at KAMIS is ready to provide expert knowledge to assist you with your project.

Contact KAMIS today at 845-628-6173 or click the blue button below for quick answers and attention from our knowledgeable staff.

KAMIS prides itself on consistently providing high quality materials and dependable service. We stand behind every product we deliver. If you are ever unsatisfied with your material, contact KAMIS for a full replacement or refund.

Kamis Inc

The entire support staff and sales engineers at KAMIS are always available during business hours. Call us to answer your technical questions and offer guidance on your projects.

Our expertise and commitment to supplying high quality products and service has enabled KAMIS to earn thousands of satisfied customers around the world.

Thin Film Vacuum Coating

Sputtering Target Bonding Preferred Method

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Sputtering Target Bonding Methods

Sputtering Target BondingMetallic bonding delivers excellent thermal conductivity and is recommended for most sputtering target bonding applications.

The most effective metallic bonding is with indium and is the preferred Kamis sputtering target bonding method. Kamis uses only high purity indium for the majority of its bonding, to ensure the strongest bond between a sputtering target and a backing plate. Indium also offers enhanced elasticity to accommodate any expansion of the target when in use.

Another advantage of bonding sputtering targets is continued use if cracking occurs during thermal shock. Without bonding to a backing plate, a crack in a sputtering target is considered unusable.

Hot pressed targets are one of the best candidates for bonding; however Kamis can bond almost any type of sputtering target to a backing plate. If you are unsure if your sputtering target should be bonded, feel free to contact us for specific advice about your target and sputtering system requirements.

Most sputtering targets are bonded to copper backing plates or copper sheet, as this material offers enhanced thermal conductivity. Kamis also offers other sputtering target backing plate options including stainless steel, molybdenum and aluminum.

Additionally, Kamis stocks numerous sputtering targets and backing plates in a wide variety of sizes and purities to work with multiple sputtering systems. Kamis also offers custom alloys and composites manufactured to your sputtering target specifications.

Kamis can bond a sputtering target to a new backing plate or to your previously used backing plate. Additionally, we have experience in bonding to a variety of backing plates including ones with holes, clips and other variations.

In addition to bonding, Kamis also offers a de-bonding service to remove your spent sputtering target from your backing plate. High purity sputtering targets can be reclaimed when the target is no longer usable for sputtering.

The Kamis sales engineers are available to answer your unique sputtering target questions!

Got specific requirements or Questions about sputtering targets, evaporation material, crucible liners, metal foil, sheet, plate, or rod and wire? The technical staff at KAMIS is ready to provide expert knowledge to assist you with your project.

Contact KAMIS today at 845-628-6173 or click the blue button below for quick answers and attention from our knowledgeable staff.

KAMIS prides itself on consistently providing high quality materials and dependable service. We stand behind every product we deliver. If you are ever unsatisfied with your material, contact KAMIS for a full replacement or refund.

Kamis Inc

The entire support staff and sales engineers at KAMIS are always available during business hours to answer your technical questions and offer guidance on your projects.

Our expertise and commitment to supplying high quality products and service has enabled KAMIS to earn thousands of satisfied customers around the world.